HIGHLY DURABLE REPLICA MOLD FOR NANOIMPRINT LITHOGRAPHY AND METHOD FOR FABRICATING THE SAME

摘要

<P>PROBLEM TO BE SOLVED: To provide a replica mold having high durability against chemical, thermal and mechanical stresses, and suitably usable in various nano-lithography technologies including thermal NIL (NanoImprint Lithography) and photo NIL, and to provide a method for simply and inexpensively fabricate the replica mold. Ž<P>SOLUTION: The replica mold is fabricated using an organic-inorganic hybrid resin having an Si-O-Ti network represented by general formula (I), wherein R is a 1-3C hydrocarbon group; and PM is a residue of propyl methacrylate. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž