发明名称 MASK FIXTURE FOR VACUUM FILM DEPOSITION AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a mask fixture for vacuum film deposition whose surface is hard to be eroded, and which is not deformed and can be repeatedly used by cleaning. Ž<P>SOLUTION: The mask fixture for vacuum film deposition is arranged at the front face of a film deposition face when the material to be film-deposited is subjected to vacuum film deposition. The mask fixture for vacuum film deposition is composed of ferritic stainless steel covered with an iron based oxide film consisting essentially of Fe<SB>3</SB>O<SB>4</SB>. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010070828(A) 申请公布日期 2010.04.02
申请号 JP20080242006 申请日期 2008.09.22
申请人 FUJIFILM CORP 发明人 WADA TAKATSUGI
分类号 C23C14/04;C23C8/14;C23C8/18 主分类号 C23C14/04
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