发明名称 |
Preparation of Lanthanide-Containing Precursors and Deposition of Lanthanide-Containing Films |
摘要 |
Methods and compositions for depositing rare earth metal-containing layers are described herein. In general, the disclosed methods deposit the precursor compounds comprising rare earth-containing compounds using vapor deposition methods such as chemical vapor deposition or atomic layer deposition. In certain embodiments, the disclosed precursor compounds include a cyclopentadienyl ligand having at least one aliphatic group as a substituent.
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申请公布号 |
US2010078601(A1) |
申请公布日期 |
2010.04.01 |
申请号 |
US20090414152 |
申请日期 |
2009.03.30 |
申请人 |
AMERICAN AIR LIQUIDE, INC. |
发明人 |
PALLEM VENKATESWARA R.;FEIST BENJAMIN J.;STAFFORD NATHAN;DUSSARRAT CHRISTIAN |
分类号 |
H01L21/3205;C07F5/00;C23C16/00;C23C16/44;H01B1/22 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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