发明名称 TECHNIQUES FOR HANDLING SUBSTRATES
摘要 <p>Techniques for handling substrates are disclosed. In one particular exemplary embodiment, the techniques may be realized as a substrate support. The substrate support may comprise a mounting portion. The substrate support may also comprise a wall extending from the mounting portion, wherein the wall may form a generally enclosed area and may have a contact surface at a distal end.</p>
申请公布号 KR20100034742(A) 申请公布日期 2010.04.01
申请号 KR20107000338 申请日期 2008.06.09
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 STONE DALE K.;STONE LYUDMILA;BLAKE JULIAN G.;GUDAPATI SUNEETHI
分类号 H01L21/687;H01L21/677;H01L21/683 主分类号 H01L21/687
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