发明名称 |
TECHNIQUES FOR HANDLING SUBSTRATES |
摘要 |
<p>Techniques for handling substrates are disclosed. In one particular exemplary embodiment, the techniques may be realized as a substrate support. The substrate support may comprise a mounting portion. The substrate support may also comprise a wall extending from the mounting portion, wherein the wall may form a generally enclosed area and may have a contact surface at a distal end.</p> |
申请公布号 |
KR20100034742(A) |
申请公布日期 |
2010.04.01 |
申请号 |
KR20107000338 |
申请日期 |
2008.06.09 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
STONE DALE K.;STONE LYUDMILA;BLAKE JULIAN G.;GUDAPATI SUNEETHI |
分类号 |
H01L21/687;H01L21/677;H01L21/683 |
主分类号 |
H01L21/687 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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