发明名称 |
COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM AND PATTERN FORMATION METHOD USING THE SAME |
摘要 |
The present invention provides a composition for forming a top anti-reflection coating having such a low refractive index that it can be suitably used in pattern formation with an ArF excimer laser beam, and further the invention also provides a pattern formation method employing that composition. The top anti-reflection coating composition comprises a particular naphthalene compound, a polymer, and a solvent. The composition is used for forming a top anti-reflection coating provided on a photoresist layer. From the photoresist layer, a pattern can be formed by use of light in 160 to 260 nm.
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申请公布号 |
US2010081087(A1) |
申请公布日期 |
2010.04.01 |
申请号 |
US20070448517 |
申请日期 |
2007.12.21 |
申请人 |
KURAMOTO KATSUTOSHI;KOBAYASHI MASAKAZU;AKIYAMA YASUSHI |
发明人 |
KURAMOTO KATSUTOSHI;KOBAYASHI MASAKAZU;AKIYAMA YASUSHI |
分类号 |
G03F7/00;C08K5/16;C08K5/18;C08K5/43;G03C1/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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