Silicon nitride deposition equipment and deposition method for semiconductor processing,申请号KR20070135916-传众专利搜索

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发明名称	Silicon nitride deposition equipment and deposition method for semiconductor processing
摘要
申请公布号	KR100950621(B1)	申请公布日期	2010.04.01
申请号	KR20070135916	申请日期	2007.12.22
申请人		发明人
分类号	H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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