发明名称 METHOD FOR PURIFYING CHEMICAL ADDED WITH CHELATING AGENT
摘要 A chelate complex is removed from a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, and the cleaning load is also reduced. Specifically disclosed is a method for purifying a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, wherein a chelate complex which is formed from impurity metals such as nickel and copper contained in an alkaline chemical is removed from the chemical by treating the alkaline chemical with an organic complex adsorbing material.
申请公布号 US2010078589(A1) 申请公布日期 2010.04.01
申请号 US20070517313 申请日期 2007.11.30
申请人 NOMURA MICRO SCIENCE CO., LTD. 发明人 IIYAMA MASAMITSU;ABE MITSUGU
分类号 C09K13/02;C09K13/00 主分类号 C09K13/02
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