发明名称 |
METHOD FOR PURIFYING CHEMICAL ADDED WITH CHELATING AGENT |
摘要 |
A chelate complex is removed from a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, and the cleaning load is also reduced. Specifically disclosed is a method for purifying a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, wherein a chelate complex which is formed from impurity metals such as nickel and copper contained in an alkaline chemical is removed from the chemical by treating the alkaline chemical with an organic complex adsorbing material. |
申请公布号 |
US2010078589(A1) |
申请公布日期 |
2010.04.01 |
申请号 |
US20070517313 |
申请日期 |
2007.11.30 |
申请人 |
NOMURA MICRO SCIENCE CO., LTD. |
发明人 |
IIYAMA MASAMITSU;ABE MITSUGU |
分类号 |
C09K13/02;C09K13/00 |
主分类号 |
C09K13/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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