| 摘要 |
An illuminating optical system of an inspection device selects an arbitrary wavelength region from the light source, and epi-illuminates the sample via the polarizer and the objective lens. A detecting optical system includes an analyzer having a polarization plane intersected with a polarization direction of the polarizer. Then, the detecting optical system detects light from the sample via the objective lens and the analyzer, and acquires a Fourier image of a sample surface based on this light. An imaging section images the Fourier image. An analyzing section performs computation for processing for determining a notable area to be affected by a state of the pattern more than other areas in the Fourier image.
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