发明名称 |
Exposure apparatus, exposure method, and method for producing device |
摘要 |
An exposure apparatus includes a mask-moving section movable in a first direction while holding a mask formed with a pattern; an illumination system which forms first and second illumination areas separated each other by a spacing distance in the first direction; a substrate-moving section movable in a second direction while holding a photosensitive substrate; a projection optical system which forms first and second projected images of the patterns of the first and second illumination areas; and a restricting section which restricts the first and second projected images to be within first and second projection areas respectively. A spacing distance between a first conjugate area with the first projection area and a second conjugate area with the second projection area is set to be such a spacing distance that scanning exposures are successively performed for first and second transfer areas provided adjacently in the second direction.
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申请公布号 |
US2010079743(A1) |
申请公布日期 |
2010.04.01 |
申请号 |
US20090461508 |
申请日期 |
2009.08.13 |
申请人 |
NIKON CORPORATION |
发明人 |
HIDAKA YASUHIRO;NAGAYAMA TADASHI;KIUCHI TOHRU |
分类号 |
G03B27/58;G03B27/32 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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