发明名称 |
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION |
摘要 |
An actinic ray-sensitive or radiation-sensitive resin composition comprising any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)?2- and OS(=O)2-, provided that -C(=O)O- is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion. |
申请公布号 |
WO2010035905(A1) |
申请公布日期 |
2010.04.01 |
申请号 |
WO2009JP67292 |
申请日期 |
2009.09.28 |
申请人 |
FUJIFILM CORPORATION;TSUCHIMURA, TOMOTAKA;SHIRAKAWA, KOJI;TSUCHIHASHI, TORU;TSUBAKI, HIDEAKI |
发明人 |
TSUCHIMURA, TOMOTAKA;SHIRAKAWA, KOJI;TSUCHIHASHI, TORU;TSUBAKI, HIDEAKI |
分类号 |
C07C309/28;G03F7/004;G03F7/038;G03F7/039 |
主分类号 |
C07C309/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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