| 摘要 |
<p>The present invention is related to a method for forming a stack of at least two patterned layers comprising the steps of : providing a first layer transparent to visible light wavelengths, - forming, upon said first transparent layer, a first patterned layer, which is not transparent to said wavelengths, - forming, upon said first patterned layer and said first transparent layer, a second transparent layer, - depositing on said second transparent layer a precursor for forming an electrically conductive layer, - irradiating said precursor, through said first transparent layer and said second transparent layer, with visible light wavelengths for forming a second patterned layer, said first patterned layer acting as a mask.</p> |
