发明名称 PHOTOCURABLE COMPOSITION
摘要 A method for the preparation of a photocurable resin by a reaction comprising the following steps i) reacting a mixture of a novolak type epoxy resin (A) and a dicyclopentadiene-phenol glycidylether resin (B) with ii) an advancement component (C) containing at least 2 phenolic hydroxyl groups per molecule; iii) reacting with an unsaturated monocarboxylic acid (D); and iv) esterification of the unsaturated group containing resin obtained from the steps of i) to iii) with a polycarboxylic acid anhydride or a carboxylic acid anhydride (E) is disclosed.
申请公布号 WO2010034531(A1) 申请公布日期 2010.04.01
申请号 WO2009EP57269 申请日期 2009.06.12
申请人 HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH;DUDDE, KAI;PIERAU, SABINE;ROTH, MARTIN 发明人 DUDDE, KAI;PIERAU, SABINE;ROTH, MARTIN
分类号 C08G59/14;C08G59/24;C08G59/42;C08G59/62;C08L63/10;C09D163/10 主分类号 C08G59/14
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