A method for the preparation of a photocurable resin by a reaction comprising the following steps i) reacting a mixture of a novolak type epoxy resin (A) and a dicyclopentadiene-phenol glycidylether resin (B) with ii) an advancement component (C) containing at least 2 phenolic hydroxyl groups per molecule; iii) reacting with an unsaturated monocarboxylic acid (D); and iv) esterification of the unsaturated group containing resin obtained from the steps of i) to iii) with a polycarboxylic acid anhydride or a carboxylic acid anhydride (E) is disclosed.
申请公布号
WO2010034531(A1)
申请公布日期
2010.04.01
申请号
WO2009EP57269
申请日期
2009.06.12
申请人
HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH;DUDDE, KAI;PIERAU, SABINE;ROTH, MARTIN