发明名称 A LASER PATTERNING SYSTEM FOR MULTI-LAYER THIN FILM AND THE PATTERNING METHOD
摘要 <p>PURPOSE: By using the characteristic spectral characteristics had at the thin film accomplishing each layer, the patterning system of the multi-layered thin film using laser and method for structuring using the same etches only the upper body thin film. The damage of the thin film of low layer is minimized with the laser beam. CONSTITUTION: A substrate(200) in which the multi-layered thin film is formed installs on the stage(100). The laser beam is injected through the laser generator(300) on the substrate in which the multi-layered thin film is formed and the multilayer foil upper body thin film formed in the top of the substrate is etched. The analyzed spectral spectrum information is delivered to the microprocessor(600) storing the spectral spectrum information of each layer thin film.</p>
申请公布号 KR20100034580(A) 申请公布日期 2010.04.01
申请号 KR20080093794 申请日期 2008.09.24
申请人 WI-A CORPORATION 发明人 KIM, SU CHAN;BAE, HYUN SUB
分类号 H01L21/027 主分类号 H01L21/027
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