METHOD OF CALCULATING PATTERN-FAILURE-OCCURRENCE-REGION, COMPUTER PROGRAM PRODUCT, PATTERN-LAYOUT EVALUATING METHOD, AND SEMICONDUCTOR-DEVICE MANUFACTURING METHOD

摘要

Method of calculating pattern-failure-occurrence-region comprising calculating a pattern failure occurrence region using relation information and a layout used for forming a convex section, the relation information being a relation between a distance from a formed pattern in a film to cover the convex section on a substrate to the convex section and a region in the film in which a shape of the formed pattern cannot satisfy a predetermined condition because of influence of the convex section.