发明名称 PATTERNING BY STAMPED METAL RESIST
摘要 A method is provided. A first layer is provided over a substrate, the first layer comprising a first material. A patterned second layer is applied over the first layer via stamping. The second layer comprising a second material. The second layer covers a first portion of the first layer, and does not cover a second portion of the first layer. The second portion of the first layer is removed via a subtractive process while the first portion of the first layer is protected from removal by the patterned second layer.
申请公布号 US2010080914(A1) 申请公布日期 2010.04.01
申请号 US20080331062 申请日期 2008.12.09
申请人 THE REGENTS OF THE UNIVERSITY OF MICHIGAN 发明人 FORREST STEPHEN R.;MIHNEV MOMCHIL T.;TAYLOR ANDRE D.;XU XIN
分类号 B05D1/32;B05D1/28 主分类号 B05D1/32
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