Method for forming three-dimensional structure, method for manufacturing semiconductor device, and semiconductor device

摘要

A method for forming a three-dimensional structure comprises: a first step of dropping a liquid material containing a structure-forming material and a solvent onto a structure forming surface; and a second step of drying at least a part of the solvent in the dropped liquid material to form a deposit layer on the structure forming surface, wherein the first step and the second step are repeated while a dropping position of the liquid material is shifted such that a next droplet of the liquid material is dropped onto the deposit layer formed of the previously-dropped liquid material to repeatedly accumulate the deposit layers on the structure forming surface, thereby forming a three-dimensional structure having at least one inclination portion inclined with respect to the structure forming surface.