EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE

摘要

An exposure apparatus according to an aspect of the present invention includes a mask-moving section (MS) which is movable in a first direction (X direction) while holding a mask (M) formed with a pattern; an illumination system (IL1, IL2) which forms a first illumination area (IR1) and a second illumination area (IR2) separated from each other by a spacing distance in the first direction; a substrate-moving section (WS) which is movable in a second direction (X direction) while holding a photosensitive substrate (W); a projection optical system (PL) which forms a first projected image of the pattern of the first illumination area and a second projected image of the pattern of the second illumination area; and a restricting section (MB, MD, CR) which restricts the first projected image and the second projected image to be within a first projection area (ER1) and a second projection area (ER2) respectively. A spacing distance, in the first direction, between a first conjugate area conjugate with the first projection area and a second conjugate area conjugate with the second projection area is set to be such a spacing distance that scanning exposures are successively performed for a first transfer area and a second transfer area, respectively, which are provided adjacently in the second direction. With this, the throughput in relation to the scanning exposure can be improved.