| 摘要 |
PURPOSE: A plate gap controlling apparatus of a successive plating equipment is provided to control an unstable flow or a whirlpool of a plating solution by minimizing gaps among substrates successively inserted to a plating tank. CONSTITUTION: A plate gap controlling apparatus of a successive plating equipment comprises a guide rail(1), hangers(2a,2b) and a conveyor(4). The hangers are successively moves along to the guide rail while including a substrate(6a). The substrate is inserted to a plating tank(5) through the conveyor. A fixed hanger sensor(7) is provided to detect the position of the hanger including the substrate. A transfer apparatus(3) transferring the hanger comprises a moving plate(9) including a movement detector(8).
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