| 摘要 |
<p>PURPOSE: After the exposure method of photomask loads mask in the exposure apparatus, the search time for finding the align key is omitted. The processing stage can be reduced while the precision of the mask production enhancing. CONSTITUTION: The mask exposure apparatus phase including stage part, camera part, and the picture part and light exposed part. Mask becomes with the loading(S100). The mask loaded in the masking apparatus is arranged in one side of the stage part(S110). It takes a photograph of the camera part and the image of the arranged mask is detected(S120). Position data of mask is extracted from the detected image and the offset value in which difference is healed is measured at from the standard value(S130).</p> |
