STRIPPER COMPOSITION FOR REMOVING PHOTORESIST

摘要

PURPOSE: A stripper composition for a nonaqueous photoresist is provided to ensure excellent strippability of a denatured and cured photoresist film in a sever processing condition such as dry etching, good solubility, and low metal corrosion. CONSTITUTION: A stripper composition for a nonaqueous photoresist comprises 70 ~ 99 weight% of a mixed polar solvent of N,N-dimethylacetamide and N-methylformamide, and 0.1 ~10 weight% of tetraethylene glycol. The stripper composition includes 0.01 ~ 1 weight% of a mixture of a triazol-based compound and a gallic acid derivative as an anticorrosive agent.