发明名称 |
Mask data generation program, mask data generation method, mask fabrication method, exposure method, and device manufacturing method |
摘要 |
This invention discloses a mask data generation program (47) which causes a computer (1) to generate data (43) of a mask (130) illuminated by an illumination light optical system (110) and used to form a latent image on a photoresist (172) via a projection optical system (172). The mask data generation program causes the computer to execute: a map generation step of Fourier-transforming a function indicating an effective light source to generate a coherent map (42) expressing a coherence distribution on the object plane of the projection optical system, on which the mask is arranged; an arrangement step of arranging a main pattern at the origin of the coherent map and arranging an auxiliary pattern in a region where the coherence with respect to the origin is equal to or higher than a set value; and a data generation step of generating a mask data (43) including the main pattern and the auxiliary pattern which are arranged in the arrangement step. |
申请公布号 |
EP1903389(B1) |
申请公布日期 |
2010.03.31 |
申请号 |
EP20070018089 |
申请日期 |
2007.09.14 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
YAMAZOE, KENJI |
分类号 |
G03F1/68;G03F7/20;H01L21/027 |
主分类号 |
G03F1/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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