| 摘要 |
A process for coating a substrate comprising condensing a radiation curable material on a substrate and curing it using an electron flux 6' with energy between 6.5eV and 300eV. The electron flux 6' is directed at the substrate (2) either simultaneously or sequentially with delivery of the curable material (5'). Curing is preferably initiated spatially and temporally concurrently with delivery of the material to the substrate. The electron flux is preferably generated using a low pressure gas plasma source with a driving voltage negative relative to the local voltage conditions. The low pressure gas plasma (6') is preferably magnetically enhanced and, for example, incorporates a magnetron.
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