发明名称 APPARATUS FOR DISPENSING GAS AND CHAMBER WITH THE SAME
摘要 PURPOSE: A gas distribution device and a chamber including the same are provided to maintain a gas distribution plate at a high temperature and insulate the gas distribution plate from the other components of the chamber by including a flexible suspension. CONSTITUTION: A plasma chamber includes a chamber wall(10), a gas distribution plate(20) and a suspension(24). The chamber wall includes one gas inlet manifold upper side or more. The gas distribution plate includes one gas outlet orifice or more. The suspension includes one gas inlet manifold sidewall with flexibility or more.
申请公布号 KR20100033988(A) 申请公布日期 2010.03.31
申请号 KR20100012871 申请日期 2010.02.11
申请人 APPLIED MATERIALS, INC. 发明人 WHITE JOHN M.;KELLER ERNST;BLONIGAN WENDELL T.
分类号 B01J19/08;H01L21/205;C23C16/44;C23C16/455;C23C16/509;H01J37/32;H01L21/02;H01L21/302;H01L21/3065;H01L21/31 主分类号 B01J19/08
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