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发明名称
The method for manufacturing non-volatile memory device having charge trap layer
摘要
申请公布号
KR100950478(B1)
申请公布日期
2010.03.31
申请号
KR20080049329
申请日期
2008.05.27
申请人
发明人
分类号
H01L27/115;H01L21/8247
主分类号
H01L27/115
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代理人
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