发明名称 MANUFACTURING METHOD OF MOLD FOR NANO IMPRINT AND PATTERN FORMING METHOD USING THE MOLD FOR NANO IMPRINT
摘要 <p>PURPOSE: A mold for nano imprint having a mold manufacturing method for nano imprint and the pattern casting method using the mold for nano imprint is the multi-stage pattern or micro-pattern is used. It patterns nano-scale and the molding of the micro-pattern of the complex three dimensional shape is made possible. CONSTITUTION: A resin(23) for a mold is spread between a substrate(21) and a master mold patterning a metal pattern(22). Substrate and master mold are arranged and it is imprinted. The resin for the mold hardens. After making heterogamete the master mold, the resin for the mold hardening as described above is etched and the replica mold(20A) for nano imprint is manufactured. The replica mold for nano imprint has the three-dimensional pattern of the multilevel form.</p>
申请公布号 KR20100033560(A) 申请公布日期 2010.03.31
申请号 KR20080092498 申请日期 2008.09.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, YOUNG TAE;KIM, JEONG GIL
分类号 H01L21/027;H01L21/56 主分类号 H01L21/027
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