发明名称 |
Positive resist composition and pattern formation method using the positive resist composition |
摘要 |
A positive resist composition comprises: (A) a resin that contains a repeating unit (A1) having a lactone structure and a cyano group, and increases its solubility to an alkali developer by action of an acid; (B) a compound that generates an acid by irradiation with actinic ray or radiation; and (C) a solvent. |
申请公布号 |
US7687219(B2) |
申请公布日期 |
2010.03.30 |
申请号 |
US20060594085 |
申请日期 |
2006.11.08 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
IWATO KAORU;KODAMA KUNIHIKO |
分类号 |
G03F7/039;G03F7/20;G03F7/30 |
主分类号 |
G03F7/039 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|