发明名称 |
Method of aligning a die and stamping a substrate for nano-imprint lithography |
摘要 |
A method of aligning die and stamping substrate for nano-imprint lithography is described. The method includes aligning the die by linearly displacing the die along a first axis using a first flexure member and pressing the die along a second axis substantially perpendicular to the first axis while maintaining coupling of the die with the first flexure member.
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申请公布号 |
US7686991(B2) |
申请公布日期 |
2010.03.30 |
申请号 |
US20070788062 |
申请日期 |
2007.04.18 |
申请人 |
WD MEDIA, INC. |
发明人 |
HARPER BRUCE M. |
分类号 |
B29C43/02;B30B15/02;B29C33/30;B29C45/02;B29C45/66;B29C45/76;B29C59/02;B29D11/00;B30B15/00;B30B15/04;B30B15/06;B30B15/14;G11B5/84 |
主分类号 |
B29C43/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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