SILICON-CARBIDE GAS DISTRIBUTION PLATE AND RF ELECTRODE FOR PLASMA ETCH CHAMBER,申请号KR20070138668-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	SILICON-CARBIDE GAS DISTRIBUTION PLATE AND RF ELECTRODE FOR PLASMA ETCH CHAMBER
摘要
申请公布号	KR100950115(B1)	申请公布日期	2010.03.30
申请号	KR20070138668	申请日期	2007.12.27
申请人		发明人
分类号	H01L21/3065;H01L21/02	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

您可能感兴趣的专利

DIGITAL-KOPIERGERAET

ELEKTROCHEMISCHE SPEICHERZELLE

CONTROLLED RELEASE OF DRUGS

PRODUCTION OF JOSS STICK DISPLAYING LETTER * PATTERN AND LIKE

WATCH OUTPUTTING ALARM BY HUMAN LANGUAGE

IMAGE HOLDING MEMBER

MANUFACTURE OF SYNTHETIC RESINNLINED METAL TUBE

SHAFT SEAL DEVICE

MEHTOD AND APPARATUS FOR MAKING SHEET TYPE MOLDING COMPOUND

SECONDARY AIR INTRODUCING IGNITION PLUG

TOUGH THERMET HAVING SOFT SURFACE LAYER

ASSEMBLED BRICK

STABILIZED POLYAMIDE SOLUTION

SHAPE FRAME FOR CONCRETE

RECOVERY OF CHLORINE

METHOD OF REDUCING FERRIC CHLORIDE

SPOT WELDER CONTROL

RUIMTETHERMOSTAAT.

PROCEDE DE BLANCHISSAGE POUR DOUBLE BLANCHIMENT DE TISSUS TACHES.