发明名称 |
COLD ANTIREFLECTION LAYER DEPOSITION PROCESS |
摘要 |
The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150 ~C, comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4'), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses. |
申请公布号 |
CA2429150(C) |
申请公布日期 |
2010.03.30 |
申请号 |
CA20012429150 |
申请日期 |
2001.11.26 |
申请人 |
ESSILOR INTERNATIONAL |
发明人 |
HELMSTETTER, YVON;BERNHARD, JEAN-DANIEL;ARROUY, FREDERIC |
分类号 |
C23C14/06;B32B7/02;G02B1/00;G02B1/11 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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