发明名称 |
Silane-based resins that can be photochemically and/or thermally structured, single-step method for their production, parent compounds and production methods that can be used for said resins |
摘要 |
A silane resin that can be structured photochemically and/or thermally is obtained by at least partial condensation of a mixture of a) at least one silane compound RaR2bSiX4-a-b wherein R is a group polymerizable photochemically and/or thermally via an organic group by radical or cationic polymerization; R2 is a straight-chain, branched, or cyclic C1-C12 alkyl group; X is identical or different and is a leaving group; a is 1 or 2; b is 0 or 1; a+b is not more than 2; and b) at least one silanediol R12Si(OH)2 wherein R1 is identical or different and is a straight-chain, branched, or cyclic C1-C12 alkyl group or a group polymerizable photochemically and/or thermally via an organic group by radical or cationic polymerization, provided the group does not contain aryl. The silane resins have dielectric properties useful in extremely high frequency applications.
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申请公布号 |
US7687654(B2) |
申请公布日期 |
2010.03.30 |
申请号 |
US20080029493 |
申请日期 |
2008.02.12 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E. V. |
发明人 |
FROEHLICH LOTHAR;JACOB STEPHANE;POPALL MICHAEL;HOUBERTZ-KRAUSS RUTH |
分类号 |
C07F7/08;C08G77/14;C08G77/20 |
主分类号 |
C07F7/08 |
代理机构 |
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