发明名称 Silane-based resins that can be photochemically and/or thermally structured, single-step method for their production, parent compounds and production methods that can be used for said resins
摘要 A silane resin that can be structured photochemically and/or thermally is obtained by at least partial condensation of a mixture of a) at least one silane compound RaR2bSiX4-a-b wherein R is a group polymerizable photochemically and/or thermally via an organic group by radical or cationic polymerization; R2 is a straight-chain, branched, or cyclic C1-C12 alkyl group; X is identical or different and is a leaving group; a is 1 or 2; b is 0 or 1; a+b is not more than 2; and b) at least one silanediol R12Si(OH)2 wherein R1 is identical or different and is a straight-chain, branched, or cyclic C1-C12 alkyl group or a group polymerizable photochemically and/or thermally via an organic group by radical or cationic polymerization, provided the group does not contain aryl. The silane resins have dielectric properties useful in extremely high frequency applications.
申请公布号 US7687654(B2) 申请公布日期 2010.03.30
申请号 US20080029493 申请日期 2008.02.12
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E. V. 发明人 FROEHLICH LOTHAR;JACOB STEPHANE;POPALL MICHAEL;HOUBERTZ-KRAUSS RUTH
分类号 C07F7/08;C08G77/14;C08G77/20 主分类号 C07F7/08
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