发明名称 GAS TREATING APPARATUS AND METHOD THEREOF
摘要 PURPOSE: A gas processing device and a method thereof are provided to improve supply efficiency of gas, and to prevent safety accidents due to the gas by using a gas ionizing unit, a gas pressing unit, an ionization chamber, and a gas storing unit. CONSTITUTION: A gas processing device comprises a gas ionizing unit(110) ionizing hydrogen gas, a gas pressing unit(120), and a gas storing unit(130). The gas ionizing unit includes an ionization chamber(112) having a gas inflow and an outflow ports. The ionization chamber includes a space for ionizing the gas. A first ionization electrode is arranged on one side wall of the ionization chamber. A second ionization chamber is arranged on the other side wall of the ionization chamber.
申请公布号 KR20100033111(A) 申请公布日期 2010.03.29
申请号 KR20080092108 申请日期 2008.09.19
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 YU, HAN YOUNG;KIM, BYUNG HOON;OH, SOON YOUNG
分类号 B01J19/08;C01B3/00 主分类号 B01J19/08
代理机构 代理人
主权项
地址
您可能感兴趣的专利