| 摘要 |
<p>PURPOSE: A thin film solar cell and a manufacturing method thereof electrically disunite an in-between transparent conductive pattern locating according to the unit cell are provided so that the inner short fault is prevented in beforehand. CONSTITUTION: A plurality of front side transparent conductive patterns(130a, 130b, 130c) separating with a plurality of first separation lines(SL1) designed to the first width according to the unit cell is formed in the upper side of the substrate(110) classified into a plurality of unit cells. A first light absorption layer(141) is formed into the top of the front side transparent conductive pattern. A plurality of in-between transparent conductive patterns(170a, 170b, 170c) separating with a plurality of second break lines(SL2) designed to the second width according to the unit cell is formed into the top of the first light absorption layer. A second light absorption layer(142) is formed into the top of the in-between transparent conductive pattern. A plurality of reflective electrodes(150a, 150b, 150c) separating with a plurality of third break lines(SL3) designed to the third width according to the unit cell is formed into the top of the second light absorption layer. A plurality of back contact electrodes(160a, 160b, 160c) separating with a plurality of fourth break lines(SL4) designed to the reflective electrode upper furnace, and the fourth width according to the unit cell is formed.</p> |
