COMPOSITION FOR FORMING SIDE WALL

摘要

A composition for forming a side wall, which is suitable for forming a side wall in contact with a photoresist pattern. Specifically disclosed is a composition for forming a side wall for lithography, which contains a silicon-containing polymer, which has a silanol group at an end while containing structural units represented by formula (1a) and formula (1b) (wherein R3 represents an organic group), and a solvent mainly composed of a specific organic solvent. Also specifically disclosed is a composition for forming a side wall for lithography, which contains a silicon-containing polymer, which has a silanol group or alternatively a silanol group and a hydrogen atom at an end while containing at least one structural unit represented by formula (2) and/or formula (3) (wherein R2 and R1 each represents an organic group), and a solvent mainly composed of a specific organic solvent.