| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a double-sided polishing device adapted to improve polishing efficiency and perform high precision polishing by preventing the tilt of an upper surface plate. <P>SOLUTION: A lower surface plate 12 includes two lower surface plates 12 and 12 adjacent to each other. Middle gears 20 are arranged at the midportion of the lower surface plates 12, and an outer gear 18 is arranged outside the lower surface plates 12, respectively. A carrier 16 includes two carriers 16 and 16 meshed between the outer gear 18 and the respective middle gears 20, and rotated on the respective lower surface plates 12. The upper surface plate 14 includes the upper surface plate 14 which is located above the adjacent two lower surface plates 12 and arranged across these two lower surface plates 12, and pinches a workpiece W held by the two carriers 16 above these lower surface plates 12. <P>COPYRIGHT: (C)2010,JPO&INPIT |
