| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a photosensitive resin composition which is excellent in plating resistance, stability after lamination and reduction of development residues and can inhibit discoloration in soldering; a photosensitive film; a permanent mask resist; and a method for producing the permanent mask resist. <P>SOLUTION: The photosensitive resin composition includes (A) a polymerizable prepolymer having a carboxyl group and an ethylenically unsaturated group, (B) a carboxylic binder polymer, (C) a photopolymerizable compound, (D) a photopolymerization initiator, and (E) a heavy metal deactivator, wherein the heavy metal deactivator (E) includes one or more selected from the group consisting of salicylic acid derivatives, hydrazide derivatives or oxalic acid amide derivatives. <P>COPYRIGHT: (C)2010,JPO&INPIT |
