发明名称 |
COPPER WIRING SURFACE PROTECTIVE LIQUID AND METHOD FOR MANUFACTURING SEMICONDUCTOR CIRCUIT |
摘要 |
Disclosed is a copper wiring material surface protective liquid for semiconductor device production, which contains an oxyalkylene adduct of acetylene diol obtained by adding an oxyalkylene having 2 or 3 carbon atoms to acetylene diol. Also disclosed is a method for manufacturing a semiconductor circuit element, wherein there is formed a semiconductor substrate comprising a copper wiring which is obtained by forming a copper film by sputtering on a silicon substrate, which has been provided with an insulating film and/or a diffusion-preventing film, then forming copper wiring containing not less than 80% by mass of copper on the copper film by plating, and then planarizing the copper wiring by CMP (chemical mechanical polishing). The method for manufacturing a semiconductor circuit element is characterized in that the semiconductor substrate, in which the copper wiring material surface is exposed, is subjected to a liquid contact treatment using the copper wiring material surface protective liquid. |
申请公布号 |
WO2010032616(A1) |
申请公布日期 |
2010.03.25 |
申请号 |
WO2009JP65320 |
申请日期 |
2009.09.02 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC.;YAMADA, KENJI;SHIMADA, KENJI;MATSUNAGA, HIROSHI |
发明人 |
YAMADA, KENJI;SHIMADA, KENJI;MATSUNAGA, HIROSHI |
分类号 |
H01L21/304;H01L21/3205;H01L23/52 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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