发明名称 COPPER WIRING SURFACE PROTECTIVE LIQUID AND METHOD FOR MANUFACTURING SEMICONDUCTOR CIRCUIT
摘要 Disclosed is a copper wiring material surface protective liquid for semiconductor device production, which contains an oxyalkylene adduct of acetylene diol obtained by adding an oxyalkylene having 2 or 3 carbon atoms to acetylene diol.  Also disclosed is a method for manufacturing a semiconductor circuit element, wherein there is formed a semiconductor substrate comprising a copper wiring which is obtained by forming a copper film by sputtering on a silicon substrate, which has been provided with an insulating film and/or a diffusion-preventing film, then forming copper wiring containing not less than 80% by mass of copper on the copper film by plating, and then planarizing the copper wiring by CMP (chemical mechanical polishing).  The method for manufacturing a semiconductor circuit element is characterized in that the semiconductor substrate, in which the copper wiring material surface is exposed, is subjected to a liquid contact treatment using the copper wiring material surface protective liquid.
申请公布号 WO2010032616(A1) 申请公布日期 2010.03.25
申请号 WO2009JP65320 申请日期 2009.09.02
申请人 MITSUBISHI GAS CHEMICAL COMPANY, INC.;YAMADA, KENJI;SHIMADA, KENJI;MATSUNAGA, HIROSHI 发明人 YAMADA, KENJI;SHIMADA, KENJI;MATSUNAGA, HIROSHI
分类号 H01L21/304;H01L21/3205;H01L23/52 主分类号 H01L21/304
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