发明名称 METHOD FOR PRODUCING FINE CRYSTAL GRAIN COPPER MATERIAL, THE FINE CRYSTAL GRAIN COPPER MATERIAL, AND SPUTTERING TARGET
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for producing a fine crystal grain copper material which can produce a fine crystal grain copper material made of high purity copper or a low concentration copper alloy at low cost, in which crystal grains are refined, and which is thermally stable, to provide a fine crystal grain copper material produced by the production method, and to provide a sputtering target composed of the fine crystal grain copper material. <P>SOLUTION: In the method for producing the fine crystal grain copper material where a copper stock 1 made of high purity copper or a low concentration copper alloy is subjected to multi-axes forging treatment of performing compression working from different directions, respectively, and a copper material in which crystal grains are refined is produced, the initial working temperature T1 at which the first compression working in the multi-axes forging is performed is a temperature in which dynamic recrystallization is at least partially generated in the copper stock 1. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010065252(A) 申请公布日期 2010.03.25
申请号 JP20080230981 申请日期 2008.09.09
申请人 MITSUBISHI MATERIALS CORP 发明人 MIURA HIROMI
分类号 C22F1/08;B21J1/04;B21J5/00;C22C9/00;C22F1/00;C23C14/34;H01L21/285 主分类号 C22F1/08
代理机构 代理人
主权项
地址