发明名称 SUBSTRATE INSPECTION APPARATUS AND SUBSTRATE INSPECTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To inspect a substrate to be inspected at a line pattern in the substrate width direction which crosses the substrate feed direction while saving a space and in a short time, in a substrate inspection apparatus and a substrate inspection method. Ž<P>SOLUTION: The substrate inspection apparatus 1 which inspects the substrate to be inspected (2) at the line pattern while transferring it includes: a first inspecting section 4 having a line-pattern illuminating section 4a which irradiates the substrate to be inspected (2) with illumination light L1 at the line pattern extending in the substrate transfer direction (arrow D1) of the substrate to be inspected (2), and a detecting section 4b for detecting illumination light L2 with which the substrate to be inspected (2) is irradiated by the line-pattern illuminating section 4a; and a drive means (8) for moving the first inspecting section 4 in the substrate transfer direction (arrow D1) and in the substrate width direction (arrow D2) which crosses the substrate transfer direction so as to follow the substrate to be inspected (2). Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010066241(A) 申请公布日期 2010.03.25
申请号 JP20080235694 申请日期 2008.09.12
申请人 OLYMPUS CORP 发明人 NISHIZAWA MAKOTO
分类号 G01N21/956 主分类号 G01N21/956
代理机构 代理人
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