| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coating composition for a protective layer of a photoresist film for liquid immersion exposure, the composition giving a good resist pattern feature in a developing step in the process of forming a fine pattern by liquid immersion, and to provide a pattern forming method. <P>SOLUTION: The coating composition for a protective film of a photoresist film for liquid immersion exposure is prepared by dissolving a water-insoluble and alkali-soluble vinyl polymer having a fluoroalcohol group in a side chain into a solvent system containing a compound expressed by formula (1) by not less than 50 mass%. The pattern forming method is carried out by using the composition. In formula (1), R<SB>1</SB>and R<SB>2</SB>each independently represents an alkyl group having 3 to 5 carbon atoms. <P>COPYRIGHT: (C)2010,JPO&INPIT |
