| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a measurement device capable of accurately measuring a characteristic of light emitted from plasma; a light source device; an exposure device; and a method of manufacturing a device. <P>SOLUTION: The light source device 13 includes: a plasma generation part 51 generating plasma 50; a collection mirror 52 for collecting exposure light EL emitted from the plasma 50; and this measurement device 70 for measuring the exposure light EL emitted from the collection mirror 52. The measurement device 70 includes: two measuring members 71, 72 arranged at positions different from each other along the optical axis direction of the exposure light EL in the optical path of the exposure light EL; detection parts 75, 76 respectively detecting characteristics of the exposure light EL entered in the measuring members 71, 72; and a control device 60 calculating the characteristic of the exposure light EL emitted from the collection mirror 52 based on the detection results of the respective detection parts. <P>COPYRIGHT: (C)2010,JPO&INPIT |
