发明名称 FLOW CONTROLLER
摘要 PROBLEM TO BE SOLVED: To provide a flow controller that corrects total amount of a fluid such as a process gas supplied to a chamber. SOLUTION: The flow control device has a pressure detecting means 40 which is installed downstream of a valve mechanism 30 of a flow channel, and detects a pressure value of the fluid flowing at the installation place and also outputs a pressure detection signal indicative of the detected pressure value, and a storage means comprising a ROM 12 stores a pressure reference value-time table showing temporal change in pressure reference value detected by the pressure detecting means 40 when a valve mechanism control means P5 controls the valve mechanism 30 by supplying the fluid to the flow channel in advance so that a flow rate set value coincides with the detected flow rate value. A valve mechanism correction control means P6 of a control means 10 receives the pressure detection signal from the pressure detecting means 40 and performs correction control over the valve mechanism 30 based upon the detected pressure value indicated by the pressure detection signal and a pressure reference value at a time, corresponding to the detection time of the detected pressure value, in the pressure reference value-time table. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010066800(A) 申请公布日期 2010.03.25
申请号 JP20080229813 申请日期 2008.09.08
申请人 HITACHI METALS LTD 发明人 FUJII ATSUSHI;GOTO TAKAO
分类号 G05D7/01;G01F1/00 主分类号 G05D7/01
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