发明名称 SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION CHAMBER
摘要 A shutter disk suitable for shield a substrate support in a physical vapor deposition chamber is provided. In one embodiment, the shutter disk includes a disk-shaped body having an outer diameter disposed between a top surface and a bottom surface. The disk-shape body includes a double step connecting the bottom surface to the outer diameter.
申请公布号 WO2010033904(A2) 申请公布日期 2010.03.25
申请号 WO2009US57663 申请日期 2009.09.21
申请人 APPLIED MATERIALS, INC.;BROWN, KARL M.;SCHALLER, JASON 发明人 BROWN, KARL M.;SCHALLER, JASON
分类号 H01L21/203 主分类号 H01L21/203
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