SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION CHAMBER
摘要
A shutter disk suitable for shield a substrate support in a physical vapor deposition chamber is provided. In one embodiment, the shutter disk includes a disk-shaped body having an outer diameter disposed between a top surface and a bottom surface. The disk-shape body includes a double step connecting the bottom surface to the outer diameter.
申请公布号
WO2010033904(A2)
申请公布日期
2010.03.25
申请号
WO2009US57663
申请日期
2009.09.21
申请人
APPLIED MATERIALS, INC.;BROWN, KARL M.;SCHALLER, JASON