| 摘要 |
<P>PROBLEM TO BE SOLVED: To enhance productivity of a substrate by exposing first and second regions to be exposed on a first substrate in parallel with first and second regions to be exposed on a second substrate in an exposure of one time. <P>SOLUTION: In an exposure method for exposing a substrate, a first region to be exposed on a first substrate P1 and a first shot region on a second substrate P2 are exposed with first and third exposure lights EL1 and EL3, respectively, by a projection optical system PL having a synthetic optical element 20 that branches a third exposure light EL3 and a fourth exposure light EL4 from the first exposure light EL1 and the second exposure light EL2, respectively, and respective second shot regions adjacent to a first shot region on the first substrate P1 and the first shot region on the second substrate P2 are exposed with the second and fourth exposure lights EL2 and EL4, respectively, by the projection optical system PL. <P>COPYRIGHT: (C)2010,JPO&INPIT |
