| 摘要 |
<P>PROBLEM TO BE SOLVED: To switch an illumination condition at high speed, and to correct an imaging characteristic at high speed according to the illumination condition. <P>SOLUTION: In the exposure method that exposes a pattern of a reticle R with an illumination light IL and a wafer W via a projection optical system PL, an intensity distribution of the illumination light IL on a lighting pupil surface PP1 is controlled according to the pattern of the reticle R by a spatial light modulator 13 having a plurality of tilt angle variable mirror elements 3, and a correction illumination light LB having a wavelength region different with that of the illumination light IL is radiated to lenses L2A and L2B comprising the projection optical system PL from correction irradiation systems 40A and 40B with a distribution according to the intensity distribution. <P>COPYRIGHT: (C)2010,JPO&INPIT |
