| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positioning apparatus solving positioning errors on the basis of position information of a processing face of a substrate. <P>SOLUTION: A surface state measuring part (microscope camera 9, surface measuring part 53a) observes the surface state of the substrate to be measured as image data. A position measuring part 53b measures the positions of an inkjet head 10 and the surface state measuring part. A memory 53c previously stores the surface state of the substrate. An error amount calculating part 53d obtains a moving error amount by comparing a surface state predicted by obtaining the predicted surface state of the substrate after movement from the memory 53c with a surface state measured with the surface state measuring part at a position after movement on the basis of the position before movement of the surface state measuring part measured with the position measuring part 53b and a movement amount of the surface state measuring part in movement of the inkjet head 10. A position correction part 53e corrects the position of the inkjet head 10, based on a movement error amount obtained with the error amount calculating part 53d. <P>COPYRIGHT: (C)2010,JPO&INPIT |
