发明名称 |
COMPOSITION, ANTIREFLECTION FILM SUBSTRATE, AND SOLAR CELL SYSTEM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition from which a silica film having a low refractive index and stability against moisture changes can be formed, and to provide an antireflection film substrate made from the composition. <P>SOLUTION: The composition contains a silicon compound and is characterized in that: when the composition is applied on a substrate and baked at a temperature of 400°C to 450°C for one minute or longer up to one hour, the obtained film has a refractive index of not more than 1.25; and when the composition is baked at a temperature of 400°C to 450°C for one minute or longer up to five hours, the obtained powder shows a water vapor adsorption difference Δ of not more than 0.03 g/g under a relative water vapor pressure in the range of 0.3<P/P<SB>0</SB><0.9 at 25°C. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010065174(A) |
申请公布日期 |
2010.03.25 |
申请号 |
JP20080234175 |
申请日期 |
2008.09.12 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
YAMAZAKI MASANORI;ABE MARI;TAKEWAKI TAKAHIKO;FUNAYAMA KATSUYA;OIZUMI JUNICHI |
分类号 |
C09D183/02;C01B33/12;C09D7/12;G02B1/11;H01L31/04 |
主分类号 |
C09D183/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|