发明名称 COMPOSITION, ANTIREFLECTION FILM SUBSTRATE, AND SOLAR CELL SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a composition from which a silica film having a low refractive index and stability against moisture changes can be formed, and to provide an antireflection film substrate made from the composition. <P>SOLUTION: The composition contains a silicon compound and is characterized in that: when the composition is applied on a substrate and baked at a temperature of 400&deg;C to 450&deg;C for one minute or longer up to one hour, the obtained film has a refractive index of not more than 1.25; and when the composition is baked at a temperature of 400&deg;C to 450&deg;C for one minute or longer up to five hours, the obtained powder shows a water vapor adsorption difference &Delta; of not more than 0.03 g/g under a relative water vapor pressure in the range of 0.3<P/P<SB>0</SB><0.9 at 25&deg;C. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010065174(A) 申请公布日期 2010.03.25
申请号 JP20080234175 申请日期 2008.09.12
申请人 MITSUBISHI CHEMICALS CORP 发明人 YAMAZAKI MASANORI;ABE MARI;TAKEWAKI TAKAHIKO;FUNAYAMA KATSUYA;OIZUMI JUNICHI
分类号 C09D183/02;C01B33/12;C09D7/12;G02B1/11;H01L31/04 主分类号 C09D183/02
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