| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pellicle and a method for manufacturing the pellicle that prevents the deposition of a sulfuric acid on a photomask, resultantly preventing the deposition of the sulfuric acid on a substrate by appropriately eliminating, in a stage of manufacturing, sulfur oxides such as sulfuric acids or sulfur compounds such as organic sulfur components derived from a pellicle frame, which have a possibility of depositing the sulfuric acid on a photomask. <P>SOLUTION: The pellicle comprises a pellicle film 11 and a pellicle frame 12 wherein the pellicle frame 12 is subjected to alumite treatment using a sulfur compound, and subjected to cleaning treatment with hot water at 60°C or higher and 100°C or lower for 30 minutes or longer. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
