发明名称 |
METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE |
摘要 |
Inside a vacuum chamber 200 a cleaning unit 204 provides atomic hydrogen or atomic deuterium for cleaning a surface 202 at a pressure of less than 10−4 Torr or of more than 10−3 Torr. The surface 202 is heated by the heating unit 203 to a temperature of at least 50° C. This allows achieving cleaning rates of more than 60 Å/h. Preferably, the surface 202 is the surface of a multilayer mirror 201 as used in an EUV lithography apparatus.
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申请公布号 |
US2010071720(A1) |
申请公布日期 |
2010.03.25 |
申请号 |
US20080234447 |
申请日期 |
2008.09.19 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
EHM DIRK HEINRICH;SCHMIDT STEFAN;KRAUS DIETER;WIESNER STEFAN;KOEHLER STEFAN;CZAP ALMUT;CHUNG HIN YIU ANTHONY |
分类号 |
B08B5/04;B08B7/00;C03C25/70 |
主分类号 |
B08B5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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