发明名称 EVALUATION METHOD AND EXPOSURE APPARATUS
摘要 An exposure apparatus includes an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of a projection optical system, a first drive mechanism configured to drive the original stage in a first direction that is a scan direction, and a second drive mechanism configured to drive the evaluation original on the original stage in a second direction orthogonal to the first direction, a width of the evaluation original in the second direction is smaller than that of the exposure original in the second direction.
申请公布号 US2010073654(A1) 申请公布日期 2010.03.25
申请号 US20090561536 申请日期 2009.09.17
申请人 CANON KABUSHIKI KAISHA 发明人 WATANABE SHU;HAGIRI MASATO
分类号 G03B27/42;G03B27/32 主分类号 G03B27/42
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