| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a droplet application apparatus capable of suppressing the occurrence of a part left without application and performing the application of excellent quality. <P>SOLUTION: The droplet application apparatus includes a housing chamber 11 for housing an application object K having an application surface Ka, a solvent supply part 13 for supplying solvent vapor into the housing chamber 11, and an application head for discharging droplets toward the application surface Ka where a solvent is dew-condensed. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
